What is carbon tetrafluoride? What is the use?
Carbon tetrafluoride, also known as tetrafluoromethane, is regarded as an inorganic compound. It is used in the plasma etching process of various integrated circuits, and also used as laser gas and refrigerant. It is relatively stable under normal temperature and pressure, but it is necessary to avoid contact with strong oxidants, flammable or combustible materials. Carbon tetrafluoride is a non-combustible gas. If it encounters high heat, it will cause the internal pressure of the container to increase, and there is a danger of cracking and explosion. Usually it can only interact with liquid ammonia-sodium metal reagent at room temperature.
Carbon tetrafluoride is currently the largest plasma etching gas used in the microelectronics industry. It can be widely used in the etching of silicon, silicon dioxide, phosphosilicate glass and other thin film materials, cleaning the surface of electronic devices, solar cell production, laser technology, Gas-phase insulation, low-temperature refrigeration, leak detection agents, and detergents in printed circuit production have a large number of applications.
Post time: Nov-01-2021