Special Gases

  • Sulfur Tetrafluoride (SF4)

    Sulfur Tetrafluoride (SF4)

    EINECS NO: 232-013-4
    CAS NO: 7783-60-0
  • Nitrous Oxide (N2O)

    Nitrous Oxide (N2O)

    Nitrous oxide, also known as laughing gas, is a dangerous chemical with the chemical formula N2O. It is a colorless, sweet-smelling gas. N2O is an oxidant that can support combustion under certain conditions, but is stable at room temperature and has a slight anesthetic effect. , and can make people laugh.
  • Carbon Tetrafluoride (CF4)

    Carbon Tetrafluoride (CF4)

    Carbon tetrafluoride, also known as tetrafluoromethane, is a colorless gas at normal temperature and pressure, insoluble in water. CF4 gas is currently the most widely used plasma etching gas in the microelectronics industry. It is also used as a laser gas, cryogenic refrigerant, solvent, lubricant, insulating material, and coolant for infrared detector tubes.
  • Sulfuryl Fluoride (F2O2S)

    Sulfuryl Fluoride (F2O2S)

    Sulfuryl fluoride SO2F2, poisonous gas, is mainly used as an insecticide. Because sulfuryl fluoride has the characteristics of strong diffusion and permeability, broad-spectrum insecticide, low dosage, low residual amount, fast insecticidal speed, short gas dispersion time, convenient use at low temperature, no effect on germination rate and low toxicity, the more It is more and more widely used in warehouses, cargo ships, buildings, reservoir dams, termite prevention, etc.
  • Silane (SiH4)

    Silane (SiH4)

    Silane SiH4 is a colorless, toxic and very active compressed gas at normal temperature and pressure. Silane is widely used in the epitaxial growth of silicon, raw materials for polysilicon, silicon oxide, silicon nitride, etc., solar cells, optical fibers, colored glass manufacturing, and chemical vapor deposition.
  • Octafluorocyclobutane (C4F8)

    Octafluorocyclobutane (C4F8)

    Octafluorocyclobutane C4F8, gas purity: 99.999%, often used as food aerosol propellant and medium gas. It is often used in semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition) process, C4F8 is used as a substitute for CF4 or C2F6, used as cleaning gas and semiconductor process etching gas.
  • Nitric Oxide (NO)

    Nitric Oxide (NO)

    Nitric oxide gas is a compound of nitrogen with the chemical formula NO. It is a colorless, odorless, poisonous gas that is insoluble in water. Nitric oxide is chemically very reactive and reacts with oxygen to form the corrosive gas nitrogen dioxide (NO₂).
  • Hydrogen Chloride (HCl)

    Hydrogen Chloride (HCl)

    Hydrogen chloride HCL Gas is a colorless gas with a pungent odor. Its aqueous solution is called hydrochloric acid, also known as hydrochloric acid. Hydrogen chloride is mainly used to make dyes, spices, medicines, various chlorides and corrosion inhibitors.
  • Hexafluoropropylene (C3F6)

    Hexafluoropropylene (C3F6)

    Hexafluoropropylene, chemical formula: C3F6, is a colorless gas at normal temperature and pressure. It is mainly used to prepare various fluorine-containing fine chemical products, pharmaceutical intermediates, fire extinguishing agents, etc., and can also be used to prepare fluorine-containing polymer materials.
  • Ammonia (NH3)

    Ammonia (NH3)

    Liquid ammonia / anhydrous ammonia is an important chemical raw material with a wide range of applications. Liquid ammonia can be used as a refrigerant. It is mainly used to produce nitric acid, urea and other chemical fertilizers, and can also be used as a raw material for medicine and pesticides. In the defense industry, it is used to make propellants for rockets and missiles.